The Periowave™ photodisinfection process has been demonstrated not to generate antibiotic resistance

MRSA remains susceptible to photodisinfection through 25 repeat exposures

Preclinical testing against a number of pathogens has demonstrated not only potent antimicrobial properties, but also that bacteria are unable to develop resistance to photodisinfection. In this study, methicillin resistant Staphylococcus aureus (MRSA) did not build resistance with subsequent exposures to photodisinfection. Instead, MRSA appears to become more susceptible to photodisinfection with repeat exposures. In similar models, antibiotics have generated partial resistance at 3 exposures, and complete resistance by 10-11 cycles.